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U.S. Department of Energy
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The effect of implanted CI on the pitting behavior of aluminum thin films.

Conference ·
OSTI ID:876291

No abstract prepared.

Research Organization:
Sandia National Laboratories
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
876291
Report Number(s):
SAND2004-6459C
Country of Publication:
United States
Language:
English

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