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Title: Parallel detecting, spectroscopic ellipsometers/polarimeters

Patent ·
OSTI ID:874410
 [1]
  1. 15927 W. Ellsworth, Golden, CO 80401

The parallel detecting spectroscopic ellipsometer/polarimeter sensor has no moving parts and operates in real-time for in-situ monitoring of the thin film surface properties of a sample within a processing chamber. It includes a multi-spectral source of radiation for producing a collimated beam of radiation directed towards the surface of the sample through a polarizer. The thus polarized collimated beam of radiation impacts and is reflected from the surface of the sample, thereby changing its polarization state due to the intrinsic material properties of the sample. The light reflected from the sample is separated into four separate polarized filtered beams, each having individual spectral intensities. Data about said four individual spectral intensities is collected within the processing chamber, and is transmitted into one or more spectrometers. The data of all four individual spectral intensities is then analyzed using transformation algorithms, in real-time.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
DOE Contract Number:
AC36-83CH10093; AC36-98GO10337
Assignee:
Furtak; Thomas E. (15927 W. Ellsworth, Golden, CO 80401)
Patent Number(s):
US 6384916
OSTI ID:
874410
Country of Publication:
United States
Language:
English

References (8)

Division-of-amplitude Photopolarimeter (DOAP) for the Simultaneous Measurement of All Four Stokes Parameters of Light journal May 1982
Four-channel polarimeter for time-resolved ellipsometry journal January 1987
Accurate calibration of the four-detector photopolarimeter with imperfect polarizing optical elements journal January 1989
Spectrophotopolarimeter: fast simultaneous real-time measurement of light parameters journal January 1992
Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry journal October 1979
Real time spectroscopic ellipsometry for characterization of nucleation, growth, and optical functions of thin films journal October 1993
On the problems of multiple overlayers in ellipsometry and a new look at multiple angle of incidence ellipsometry journal December 1976
Construction, calibration, and testing of a four‐detector photopolarimeter journal January 1988