Highly damped kinematic coupling for precision instruments
Patent
·
OSTI ID:874143
- Livermore, CA
A highly damped kinematic coupling for precision instruments. The kinematic coupling provides support while causing essentially no influence to its nature shape, with such influences coming, for example, from manufacturing tolerances, temperature changes, or ground motion. The coupling uses three ball-cone constraints, each combined with a released flexural degree of freedom. This arrangement enables a gain of higher load capacity and stiffness, but can also significantly reduce the friction level in proportion to the ball radius divided by the distance between the ball and the hinge axis. The blade flexures reduces somewhat the stiffness of the coupling and provides an ideal location to apply constrained-layer damping which is accomplished by attaching a viscoelastic layer and a constraining layer on opposite sides of each of the blade flexures. The three identical ball-cone flexures provide a damped coupling mechanism to kinematically support the projection optics system of the extreme ultraviolet lithography (EUVL) system, or other load-sensitive apparatus.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Number(s):
- US 6325351
- OSTI ID:
- 874143
- Country of Publication:
- United States
- Language:
- English
| Principles and techniques for designing precision machines | report | February 1999 |
Highly damped exactly constrained mounting of an x-ray telescope
|
conference | May 1995 |
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/248/52/
accomplished
apparatus
apply
arrangement
attaching
axis
ball
ball-cone
blade
capacity
causing
changes
combined
coming
constrained-layer
constraining
constraints
coupling
damped
damping
degree
distance
divided
enables
essentially
euvl
example
extreme
extreme ultraviolet
flexural
flexures
freedom
friction
ground
highly
hinge
ideal
identical
influence
influences
instruments
kinematic
kinematically
layer
level
lithography
load
load-sensitive
location
manufacturing
mechanism
motion
nature
opposite
optics
precision
projection
proportion
provide
provides
provides support
radius
reduce
reduces
released
shape
significantly
somewhat
stiffness
support
temperature
tolerances
ultraviolet
ultraviolet lithography
viscoelastic
accomplished
apparatus
apply
arrangement
attaching
axis
ball
ball-cone
blade
capacity
causing
changes
combined
coming
constrained-layer
constraining
constraints
coupling
damped
damping
degree
distance
divided
enables
essentially
euvl
example
extreme
extreme ultraviolet
flexural
flexures
freedom
friction
ground
highly
hinge
ideal
identical
influence
influences
instruments
kinematic
kinematically
layer
level
lithography
load
load-sensitive
location
manufacturing
mechanism
motion
nature
opposite
optics
precision
projection
proportion
provide
provides
provides support
radius
reduce
reduces
released
shape
significantly
somewhat
stiffness
support
temperature
tolerances
ultraviolet
ultraviolet lithography
viscoelastic