Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom

Gupta, Sandhya; Tuttle, Gary L; Sigalas, Mihail; McCalmont, Jonathan S; Ho, Kai-Ming

Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom

Patent · Sun Dec 31 23:00:00 EST 2000

OSTI ID:873930

Gupta, Sandhya ^[1]; Tuttle, Gary L ^[2]; Sigalas, Mihail ^[2]; McCalmont, Jonathan S ^[2]; Ho, Kai-Ming ^[2]

Bloomington, MN
Ames, IA

A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.

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Research Organization:: Ames Laboratory (AMES), Ames, IA; Iowa State University, Ames, IA (US)

DOE Contract Number:: W-7405-ENG-82

Assignee:: Iowa State University Research Foundation (Ames, IA)

Patent Number(s):: US 6274293

Application Number:: 09/086,790

OSTI ID:: 873930

Country of Publication:: United States

Language:: English

References (24)

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Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom

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References (24)

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