Method of manufacturing flexible metallic photonic band gap structures, and structures resulting therefrom
- Bloomington, MN
- Ames, IA
A method of manufacturing a flexible metallic photonic band gap structure operable in the infrared region, comprises the steps of spinning on a first layer of dielectric on a GaAs substrate, imidizing this first layer of dielectric, forming a first metal pattern on this first layer of dielectric, spinning on and imidizing a second layer of dielectric, and then removing the GaAs substrate. This method results in a flexible metallic photonic band gap structure operable with various filter characteristics in the infrared region. This method may be used to construct multi-layer flexible metallic photonic band gap structures. Metal grid defects and dielectric separation layer thicknesses are adjusted to control filter parameters.
- Research Organization:
- Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
- DOE Contract Number:
- W-7405-ENG-82
- Assignee:
- Iowa State University Research Foundation (Ames, IA)
- Patent Number(s):
- US 6274293
- Application Number:
- 09/086,790
- OSTI ID:
- 873930
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
manufacturing
flexible
metallic
photonic
band
gap
structures
resulting
structure
operable
infrared
region
steps
spinning
layer
dielectric
gaas
substrate
imidizing
forming
metal
pattern
removing
results
filter
characteristics
construct
multi-layer
grid
defects
separation
thicknesses
adjusted
control
parameters
layer thickness
flexible metal
photonic band
infrared region
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