Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography

Patent · Mon Jan 01 00:00:00 EST 2001

OSTI ID:873545

Chapman, Henry N ^[1]; Nugent, Keith A ^[2]

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1. Livermore, CA
2. North Fitzroy, AU

A condenser for use with a ring-field deep ultraviolet or extreme ultraviolet lithography system. A condenser includes a ripple-plate mirror which is illuminated by a collimated beam at grazing incidence. The ripple plate comprises a plate mirror into which is formed a series of channels along an axis of the mirror to produce a series of concave surfaces in an undulating pattern. Light incident along the channels of the mirror is reflected onto a series of cones. The distribution of slopes on the ripple plate leads to a distribution of angles of reflection of the incident beam. This distribution has the form of an arc, with the extremes of the arc given by the greatest slope in the ripple plate. An imaging mirror focuses this distribution to a ring-field arc at the mask plane.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 6186632
• OSTI ID: 873545
• Country of Publication: United States
• Language: English

Related Subjects

condenser
ring-field
deep-ultraviolet
extreme-ultraviolet
lithography
deep
ultraviolet
extreme
ripple-plate
mirror
illuminated
collimated
beam
grazing
incidence
ripple
plate
comprises
formed
series
channels
axis
produce
concave
surfaces
undulating
pattern
light
incident
reflected
cones
distribution
slopes
leads
angles
reflection
form
extremes
slope
imaging
focuses
mask
plane
light incident
ultraviolet lithography
extreme ultraviolet
incident beam
collimated beam
concave surface
ring-field deep
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