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Inspection of lithographic mask blanks for defects

Patent ·
OSTI ID:873511
 [1]
  1. Santa Cruz, CA
+ Show Author Affiliations
A visible light method for detecting sub-100 nm size defects on mask blanks used for lithography. By using optical heterodyne techniques, detection of the scattered light can be significantly enhanced as compared to standard intensity detection methods. The invention is useful in the inspection of super-polished surfaces for isolated surface defects or particulate contamination and in the inspection of lithographic mask or reticle blanks for surface defects or bulk defects or for surface particulate contamination.
Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of California (Oakland, CA)
Patent Number(s):
US 6177993
OSTI ID:
873511
Country of Publication:
United States
Language:
English

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Related Subjects

/356/
blanks
bulk
compared
contamination
defects
detecting
detection
detection method
detection methods
enhanced
heterodyne
heterodyne technique
heterodyne techniques
inspection
intensity
isolated
light
lithographic
lithographic mask
lithography
mask
mask blanks
method
methods
nm
optical
optical heterodyne
particulate
particulate contamination
reticle
scattered
scattered light
significantly
significantly enhanced
size
standard
standard intensity
sub-100
super-polished
surface
surface defects
surfaces
techniques
useful
visible
visible light