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Phase-shifting point diffraction interferometer focus-aid enhanced mask

Patent ·
OSTI ID:873397
 [1]
  1. 5239 Miles Ave., Apt. A, Oakland, CA 94618
+ Show Author Affiliations
A phase-shifting point diffraction interferometer system (PS/PDI) employing a PS/PDI mask that includes a PDI focus aid is provided. The PDI focus aid mask includes a large or secondary reference pinhole that is slightly displaced from the true or primary reference pinhole. The secondary pinhole provides a larger capture tolerance for interferometrically performing fine focus. With the focus-aid enhanced mask, conventional methods such as the knife-edge test can be used to perform an initial (or rough) focus and the secondary (large) pinhole is used to perform interferometric fine focus. Once the system is well focused, high accuracy interferometry can be performed using the primary (small) pinhole.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
DOE Contract Number:
AC03-76SF00098
Assignee:
Naulleau, Patrick (5239 Miles Ave., Apt. A, Oakland, CA 94618)
Patent Number(s):
US 6151115
OSTI ID:
873397
Country of Publication:
United States
Language:
English

References (4)

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
  • Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309563
conference June 1998
Effect of intensity error correlation on the computed phase of phase-shifting interferometry journal January 1990
Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures journal November 1995
Phase-shifting point diffraction interferometer journal January 1996

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