Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Time-of-flight SIMS/MSRI reflectron mass analyzer and method

Patent ·
OSTI ID:872787
 [1];  [2];  [3];  [4];  [5]
  1. Clifton Park, NY
  2. Downers Grove, IL
  3. Naperville, IL
  4. Houston, TX
  5. Colorado Springs, CO

A method and apparatus for analyzing the surface characteristics of a sample by Secondary Ion Mass Spectroscopy (SIMS) and Mass Spectroscopy of Recoiled Ions (MSRI) is provided. The method includes detecting back scattered primary ions, low energy ejected species, and high energy ejected species by ion beam surface analysis techniques comprising positioning a ToF SIMS/MSRI mass analyzer at a predetermined angle .theta., where .theta. is the angle between the horizontal axis of the mass analyzer and the undeflected primary ion beam line, and applying a specific voltage to the back ring of the analyzer. Preferably, .theta. is less than or equal to about 120.degree. and, more preferably, equal to 74.degree.. For positive ion analysis, the extractor, lens, and front ring of the reflectron are set at negative high voltages (-HV). The back ring of the reflectron is set at greater than about +700V for MSRI measurements and between the range of about +15 V and about +50V for SIMS measurements. The method further comprises inverting the polarity of the potentials applied to the extractor, lens, front ring, and back ring to obtain negative ion SIMS and/or MSRI data.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL
DOE Contract Number:
W-31109-ENG-38
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 6008491
Application Number:
08/953,792
OSTI ID:
872787
Country of Publication:
United States
Language:
English

References (1)

Novel reflectron time of flight analyzer for surface analysis using secondary ion mass spectroscopy and mass spectroscopy of recoiled ions
  • Smentkowski, V. S.; Krauss, A. R.; Gruen, D. M.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, Issue 5 https://doi.org/10.1116/1.581923
journal September 1999