Method for correcting imperfections on a surface
- Albuquerque, NM
A process for producing near perfect optical surfaces. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-95AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- US 5948468
- Application Number:
- 08/850,665
- OSTI ID:
- 872501
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
correcting
imperfections
surface
process
producing
near
perfect
optical
surfaces
previously
polished
measured
determine
deviations
desired
multi-aperture
mask
designed
based
measurement
fabricated
deposition
correct
acceptable
level
various
geometries
variable
individual
aperture
sizes
fixed
grid
apertures
spacing
filled
vacuum
thickness
material
silicon
monoxide
produce
amorphous
bonds
glass
substrate
silicon monoxide
variable aperture
vacuum deposition
deposition process
glass substrate
optical surfaces
optical surface
near perfect
producing near
acceptable level
dual aperture
designed based
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