Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Ruffner, Judith Alison

Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Patent · Thu Dec 31 23:00:00 EST 1998

OSTI ID:872327

Ruffner, Judith Alison ^[1]

Albuquerque, NM

A method for coating (flat or non-flat) optical substrates with high-reflectivity multi-layer coatings for use at Deep Ultra-Violet ("DUV") and Extreme Ultra-Violet ("EUV") wavelengths. The method results in a product with minimum feature sizes of less than 0.10-.mu.m for the shortest wavelength (13.4-nm). The present invention employs a computer-based modeling and deposition method to enable lateral and vertical thickness control by scanning the position of the substrate with respect to the sputter target during deposition. The thickness profile of the sputter targets is modeled before deposition and then an appropriate scanning algorithm is implemented to produce any desired, radially-symmetric thickness profile. The present invention offers the ability to predict and achieve a wide range of thickness profiles on flat or figured substrates, i.e., account for 1/R.sup.2 factor in a model, and the ability to predict and accommodate changes in deposition rate as a result of plasma geometry, i.e., over figured substrates.

Research Organization:: SANDIA CORP

DOE Contract Number:: AC04-94AL85000

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Number(s):: US 5911858

OSTI ID:: 872327

Country of Publication:: United States

Language:: English

References (13)

Computer search for layer materials that maximize the reflectivity of X-ray multilayers Rosenbluth, A. E. Revue de Physique Appliquée, Vol. 23, Issue 10 https://doi.org/10.1051/rphysap:0198800230100159900	journal	January 1988
XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr_3C_2, Mo, and W Windt, David L. Applied Optics, Vol. 30, Issue 1 https://doi.org/10.1364/AO.30.000015	journal	January 1991
Near perfect optics Goeke, R.; Farnsworth, A. V.; Neumann, C. C. https://doi.org/10.2172/251600	report	June 1996
The scattering of x rays from nonideal multilayer structures Stearns, D. G. Journal of Applied Physics, Vol. 65, Issue 2 https://doi.org/10.1063/1.343131	journal	January 1989
Multilayer mirror technology for soft-x-ray projection lithography Stearns, D. G.; Rosen, R. S.; Vernon, S. P. Applied Optics, Vol. 32, Issue 34 https://doi.org/10.1364/AO.32.006952	journal	January 1993
Low‐Loss Reflection Coatings Using Absorbing Materials Spiller, Eberhard Applied Physics Letters, Vol. 20, Issue 9 https://doi.org/10.1063/1.1654189	journal	May 1972
Extreme ultraviolet lithography for circuit fabrication at 0.1-μm feature size Tichenor, Daniel A.; Kubiak, Glenn D.; Stulen, Richard H. SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, SPIE Proceedings https://doi.org/10.1117/12.220978	conference	September 1995
Semiconductor lithography for the next millennium Geppert, L. IEEE Spectrum, Vol. 33, Issue 4 https://doi.org/10.1109/6.486632	journal	April 1996
Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating Spiller, Eberhard Optical Engineering, Vol. 25, Issue 8 https://doi.org/10.1117/12.7973935	journal	August 1986
Interface imperfections in metal/Si multilayers Windt, D. L.; Hull, R.; Waskiewicz, W. K. Journal of Applied Physics, Vol. 71, Issue 6 https://doi.org/10.1063/1.351040	journal	March 1992
Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering Stearns, D. G.; Rosen, R. S.; Vernon, S. P. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 5 https://doi.org/10.1116/1.577221	journal	September 1991
Multilayer facilities required for extreme-ultraviolet lithography Windt, D. L. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 12, Issue 6 https://doi.org/10.1116/1.587449	journal	November 1994
Light-induced dry etching of semiconductors in the vacuum ultraviolet Streller, Udo; Raaf, Heribert; Schwentner, Nikolaus Optoelectronics and High-Power Lasers & Applications, SPIE Proceedings https://doi.org/10.1117/12.309501	conference	June 1998

Similar Records

Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Patent · Tue Jun 15 00:00:00 EDT 1999 · OSTI ID:6367198

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography

Journal Article · Wed Jun 20 00:00:00 EDT 2007 · Applied Optics · OSTI ID:20929751

Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer

Patent · Mon Dec 31 23:00:00 EST 2001 · OSTI ID:874336

Related Subjects

/204/
10-
13
4-nm
ability
accommodate
account
achieve
algorithm
appropriate
changes
coating
coatings
computer-based
control
deep
deep ultra-violet
deposition
deposition method
deposition rate
desired
duv
employs
enable
euv
extreme
extreme ultra-violet
extreme ultraviolet
factor
feature
feature sizes
figured
film
film deposition
flat
geometry
high-precision
high-reflectivity
implemented
lateral
method
method results
minimum
mirrors
model
modeled
modeling
multi-layer
multi-layer coating
multi-layered
non-flat
offers
optical
optical substrate
optical substrates
plasma
position
predict
produce
product
profile
profiles
radially-symmetric
range
rate
respect
result
results
scanning
shortest
sizes
sputter
sputter target
sputter targets
substrate
substrates
target
targets
thickness
ultra-violet
ultraviolet
vertical
wavelength
wavelengths
wide
wide range

Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors

Citation Formats

References (13)

Similar Records

Related Subjects