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Magnetron sputtered boron films

Patent ·
OSTI ID:871623
 [1];  [1]
  1. Livermore, CA
+ Show Author Affiliations

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
Regents of University of Califonia (Oakland, CA)
Patent Number(s):
US 5766747
OSTI ID:
871623
Country of Publication:
United States
Language:
English

References (3)

Magnetron sputter deposition of boron and boron carbide journal December 1991
Magnetron sputtered boron films and Ti/B multilayer structures
  • Makowiecki, D. M.; Jankowski, A. F.; McKernan, M. A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 6 https://doi.org/10.1116/1.576419
journal November 1990
Boron and silicon: filters for the extreme ultraviolet journal January 1985

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Related Subjects

/428/
amorphous
amorphous boron
band
band pass
boron
boron films
boron sputter
components
contain
crystalline
crystalline boron
density
density crystalline
deposition
deposition method
deposition process
deposition processes
described
element
enhance
enhance reflectivity
etc
features
films
films contain
films prepared
filters
found
grazing
growth
growth features
hardened
hot
hot isostatic
incidence
isostatic
isostatic pressing
machine
machine tool
machine tools
magnetron
magnetron sputter
magnetron sputtered
method
method requires
mirrors
morphological
morphological growth
normal
normal incidence
optical
optical component
optical components
pass
pass filter
pass filters
physical
physical vapor
prepared
pressing
processes
producing
producing hard
production
reflectivity
requires
sputter
sputter deposit
sputter deposition
sputter target
sputtered
sputtered boron
surfaces
surfacing
target
titanium
tools
ultra-thin
ultra-thin band
unlike
useful
vapor
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various
various physical
z
z element
z optical