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Title: Magnetron sputtered boron films

Abstract

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

Inventors:
 [1];  [1]
  1. Livermore, CA
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
871623
Patent Number(s):
US 5766747
Assignee:
Regents of University of Califonia (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
magnetron; sputtered; boron; films; method; described; production; titanium; sputter; deposition; amorphous; contain; morphological; growth; features; unlike; found; prepared; various; physical; vapor; processes; requires; density; crystalline; target; hot; isostatic; pressing; useful; producing; hardened; surfaces; surfacing; machine; tools; etc; ultra-thin; band; pass; filters; z; element; optical; components; mirrors; enhance; reflectivity; grazing; normal; incidence; normal incidence; magnetron sputter; pass filters; morphological growth; amorphous boron; band pass; deposition method; machine tools; sputter deposition; boron films; optical components; vapor deposition; deposition process; hot isostatic; physical vapor; machine tool; isostatic pressing; deposition processes; sputter target; pass filter; sputtered boron; method requires; z element; ultra-thin band; various physical; growth features; crystalline boron; density crystalline; boron sputter; optical component; films prepared; enhance reflectivity; films contain; magnetron sputtered; sputter deposit; z optical; producing hard; /428/

Citation Formats

Makowiecki, Daniel M, and Jankowski, Alan F. Magnetron sputtered boron films. United States: N. p., 1998. Web.
Makowiecki, Daniel M, & Jankowski, Alan F. Magnetron sputtered boron films. United States.
Makowiecki, Daniel M, and Jankowski, Alan F. Tue . "Magnetron sputtered boron films". United States. https://www.osti.gov/servlets/purl/871623.
@article{osti_871623,
title = {Magnetron sputtered boron films},
author = {Makowiecki, Daniel M and Jankowski, Alan F},
abstractNote = {A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.},
doi = {},
url = {https://www.osti.gov/biblio/871623}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1998},
month = {6}
}

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Works referenced in this record:

Magnetron sputtered boron films and Ti/B multilayer structures
journal, November 1990

  • Makowiecki, D. M.; Jankowski, A. F.; McKernan, M. A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 6
  • https://doi.org/10.1116/1.576419

Magnetron sputter deposition of boron and boron carbide
journal, December 1991


Boron and silicon: filters for the extreme ultraviolet
journal, January 1985