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Permanent laser conditioning of thin film optical materials

Patent ·
OSTI ID:870191
 [1];  [2];  [3];  [4];  [3]
  1. Palo Alto, CA
  2. Pleasanton, CA
  3. Livermore, CA
  4. Tracy, CA
+ Show Author Affiliations
The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.
Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA
DOE Contract Number:
W-7405-ENG-48
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 5472748
OSTI ID:
870191
Country of Publication:
United States
Language:
English

References (3)

The effect of baking and pulsed laser irradiation on the bulk laser damage threshold of potassium dihydrogen phosphate crystals journal July 1982
Temporary laser damage threshold enhancement by laser conditioning of antireflection‐coated glass journal August 1987
The Properties of Laser Annealed Dielectric Films book

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Related Subjects

/427/
age threshold
below
comprises
conditioning
damage
damage threshold
film
films
fluence
increased
irradiating
laser
laser damage
materials
method
optical
optical materials
permanent
permanently
producing
producing optical
resulting
threshold
unconditioned