Method for forming H2-permselective oxide membranes

Patent · Sun Jan 01 00:00:00 EST 1995

OSTI ID:870080

Gavalas, George R ^[1]; Nam, Suk Woo ^[2]; Tsapatsis, Michael ^[3]; Kim, Soojin ^[4]

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1. Altadena, CA
2. Seoul, KR
3. Pasadena, CA
4. West Orange, NJ

Methods of forming permselective oxide membranes that are highly selective to permeation of hydrogen by chemical deposition of reactants in the pore of porous tubes, such as Vycor.TM. glass or Al.sub.2 O.sub.3 tubes. The porous tubes have pores extending through the tube wall. The process involves forming a stream containing a first reactant of the formula RX.sub.n, wherein R is silicon, titanium, boron or aluminum, X is chlorine, bromine or iodine, and n is a number which is equal to the valence of R; and forming another stream containing water vapor as the second reactant. Both of the reactant streams are passed along either the outside or the inside surface of a porous tube and the streams react in the pores of the porous tube to form a nonporous layer of R-oxide in the pores. The membranes are formed by the hydrolysis of the respective halides. In another embodiment, the first reactant stream contains a first reactant having the formula SiH.sub.n Cl.sub.4-n where n is 1, 2 or 3; and the second reactant stream contains water vapor and oxygen. In still another embodiment the first reactant stream containing a first reactant selected from the group consisting of Cl.sub.3 SiOSiCl.sub.3, Cl.sub.3 SiOSiCl.sub.2 OSiCl.sub.3, and mixtures thereof and the second reactant stream contains water vapor. In still another embodiment, membrane formation is carried out by an alternating flow deposition method. This involves a sequence of cycles, each cycle comprising introduction of the halide-containing stream and allowance of a specific time for reaction followed by purge and flow of the water vapor containing stream for a specific length of time. In all embodiments the nonporous layers formed are selectively permeable to hydrogen.

• Research Organization: CALIFORNIA INSTITUTE OF TECH
• Sponsoring Organization: USDOE
• DOE Contract Number: FG22-92PC92525; AC21-90MC26365
• Assignee: California Institute of Technology (Pasadena, CA)
• Patent Number(s): US 5453298
• OSTI ID: 870080
• Country of Publication: United States
• Language: English

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/427/95/96/