Precision optical slit for high heat load or ultra high vacuum
- Hayward, CA
- Albany, CA
- Richmond, CA
This invention relates generally to slits used in optics that must be precisely aligned and adjusted. The optical slits of the present invention are useful in x-ray optics, x-ray beam lines, optical systems in which the entrance slit is critical for high wavelength resolution. The invention is particularly useful in ultra high vacuum systems where lubricants are difficult to use and designs which avoid the movement of metal parts against one another are important, such as monochrometers for high wavelength resolution with ultra high vacuum systems. The invention further relates to optical systems in which temperature characteristics of the slit materials is important. The present invention yet additionally relates to precision slits wherein the opposing edges of the slit must be precisely moved relative to a center line between the edges with each edge retaining its parallel orientation with respect to the other edge and/or the center line.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- Regents of University of California (Berkeley, CA)
- Patent Number(s):
- US 5384662
- OSTI ID:
- 869723
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
optical
slit
heat
load
ultra
vacuum
relates
slits
optics
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aligned
adjusted
useful
x-ray
beam
lines
systems
entrance
critical
wavelength
resolution
particularly
lubricants
difficult
designs
avoid
movement
metal
monochrometers
temperature
characteristics
materials
additionally
opposing
edges
moved
relative
center
line
edge
retaining
parallel
orientation
respect
beam line
opposing edges
vacuum systems
heat load
x-ray optics
optical systems
center line
x-ray beam
particularly useful
moved relative
temperature characteristic
entrance slit
optical slit
precisely aligned
beam lines
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