skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement

Abstract

An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the "ripple mirror ratio", the energy of the injected electrons, and their v.sub..perp. /v.sub.51 ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v.sub..perp..

Inventors:
 [1];  [2]
  1. Princeton Junction, NJ
  2. Princeton, NJ
Publication Date:
Research Org.:
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ
OSTI Identifier:
868841
Patent Number(s):
US 5225146
Assignee:
United States of America as represented by United States (Washington, DC)
DOE Contract Number:  
AC02-76CH03073
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
injection; electrons; predominantly; perpendicular; energy; toroidal; field; ripple; tokamak; plasma; improve; confinement; electron; scheme; controlling; transport; injected; region; created; localized; poloidal; bending; magnets; trapped; grad-b; drift; vertically; interior; detrapped; charging; negative; calculations; indicate; highly; velocity; remain; stable; kinetic; instabilities; regime; experiments; penetration; distance; controlled; mirror; ratio; perp; 51; torque; due; radial; current; accomplished; flat; cathode; containing; ech; cavity; pump; toroidal field; plasma confinement; field region; poloidal field; tokamak plasma; cathode containing; electron injection; field ripple; injection scheme; /376/

Citation Formats

Ono, Masayuki, and Furth, Harold. Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement. United States: N. p., 1993. Web.
Ono, Masayuki, & Furth, Harold. Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement. United States.
Ono, Masayuki, and Furth, Harold. Fri . "Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement". United States. https://www.osti.gov/servlets/purl/868841.
@article{osti_868841,
title = {Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement},
author = {Ono, Masayuki and Furth, Harold},
abstractNote = {An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the "ripple mirror ratio", the energy of the injected electrons, and their v.sub..perp. /v.sub.51 ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v.sub..perp..},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1993},
month = {1}
}

Patent:

Save / Share: