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Injection of electrons with predominantly perpendicular energy into an area of toroidal field ripple in a tokamak plasma to improve plasma confinement

Patent ·
OSTI ID:868841
 [1];  [2]
  1. Princeton Junction, NJ
  2. Princeton, NJ
+ Show Author Affiliations
An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the "ripple mirror ratio", the energy of the injected electrons, and their v.sub..perp. /v.sub.51 ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v.sub..perp..
Research Organization:
Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ
DOE Contract Number:
AC02-76CH03073
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 5225146
OSTI ID:
868841
Country of Publication:
United States
Language:
English

References (1)

H-mode behavior induced by cross-field currents in a tokamak journal November 1989

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