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Title: Controlled metal-semiconductor sintering/alloying by one-directional reverse illumination

Patent ·
OSTI ID:868831

Metal strips deposited on a top surface of a semiconductor substrate are sintered at one temperature simultaneously with alloying a metal layer on the bottom surface at a second, higher temperature. This simultaneous sintering of metal strips and alloying a metal layer on opposite surfaces of the substrate at different temperatures is accomplished by directing infrared radiation through the top surface to the interface of the bottom surface with the metal layer where the radiation is absorbed to create a primary hot zone with a temperature high enough to melt and alloy the metal layer with the bottom surface of the substrate. Secondary heat effects, including heat conducted through the substrate from the primary hot zone and heat created by infrared radiation reflected from the metal layer to the metal strips, as well as heat created from some primary absorption by the metal strips, combine to create secondary hot zones at the interfaces of the metal strips with the top surface of the substrate. These secondary hot zones are not as hot as the primary hot zone, but they are hot enough to sinter the metal strips to the substrate.

Research Organization:
Midwest Research Institute, Kansas City, MO (United States)
DOE Contract Number:
AC02-83CH10093
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 5223453
OSTI ID:
868831
Country of Publication:
United States
Language:
English

References (1)

Fabrication of diode arrays for photovoltaic characterization of silicon substrates journal May 1988