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Thin film coating process using an inductively coupled plasma

Patent ·
OSTI ID:867256
 [1];  [1];  [1]
  1. Ames, IA
+ Show Author Affiliations

Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.

Research Organization:
Ames Laboratory (AMES), Ames, IA; Iowa State University, Ames, IA (US)
DOE Contract Number:
W-7405-ENG-82
Assignee:
Iowa State University Reserach Foundation, Inc. (Ames, IA)
Patent Number(s):
US 4897282
Application Number:
07/199,286
OSTI ID:
867256
Country of Publication:
United States
Language:
English

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Related Subjects

/427/250/
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applied
coating
coating material
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normally
normally solid
orifice
particles
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shock
shock wave
skimmer
solid
solid material
solid materials
substrates
target
target substrate
target substrates
tip
ultrapure
vacuum
vaporized
velocity
wave
wave generated
zone
zone maintained