Stabilized chromium oxide film
Patent
·
OSTI ID:866475
- Los Altos, CA
- Palo Alto, CA
Stabilized air-oxidized chromium films deposited on high-power klystron ceramic windows and sleeves having a thickness between 20 and 150.ANG. are useful in lowering secondary electron emission yield and in avoiding multipactoring and window failure due to overheating. The ceramic substrate for the film is chosen from alumina, sapphire or beryllium oxide.
- Research Organization:
- Stanford Linear Accelerator Center (SLAC), Menlo Park, CA
- DOE Contract Number:
- AC03-76SF00515
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 4719436
- OSTI ID:
- 866475
- Country of Publication:
- United States
- Language:
- English
Similar Records
Stabilized chromium oxide film
Stabilized chromium oxide film
Properties of thin antimultipactor TiN and Cr/sub 2/O/sub 3/ coatings for klystron windows
Patent
·
Mon Aug 04 00:00:00 EDT 1986
·
OSTI ID:6710757
Stabilized chromium oxide film
Patent
·
Mon Jan 11 23:00:00 EST 1988
·
OSTI ID:5415305
Properties of thin antimultipactor TiN and Cr/sub 2/O/sub 3/ coatings for klystron windows
Journal Article
·
Mon Sep 01 00:00:00 EDT 1986
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:5062602
Related Subjects
/333/204/427/
150
20
air-oxidized
alumina
ang
avoiding
beryllium
beryllium oxide
ceramic
ceramic substrate
chosen
chromium
chromium film
chromium oxide
deposited
due
electron
electron emission
emission
failure
failure due
film
films
films deposited
high-power
klystron
lowering
multipactoring
overheating
oxide
oxide film
sapphire
secondary
secondary electron
sleeves
stabilized
substrate
thickness
useful
window
windows
yield
150
20
air-oxidized
alumina
ang
avoiding
beryllium
beryllium oxide
ceramic
ceramic substrate
chosen
chromium
chromium film
chromium oxide
deposited
due
electron
electron emission
emission
failure
failure due
film
films
films deposited
high-power
klystron
lowering
multipactoring
overheating
oxide
oxide film
sapphire
secondary
secondary electron
sleeves
stabilized
substrate
thickness
useful
window
windows
yield