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Title: Stabilized chromium oxide film

Abstract

Stabilized air-oxidized chromium films deposited on high-power klystron ceramic windows and sleeves having a thickness between 20 and 150.ANG. are useful in lowering secondary electron emission yield and in avoiding multipactoring and window failure due to overheating. The ceramic substrate for the film is chosen from alumina, sapphire or beryllium oxide.

Inventors:
 [1];  [2]
  1. (Los Altos, CA)
  2. (Palo Alto, CA)
Publication Date:
Research Org.:
Stanford Linear Accelerator Center (SLAC), Menlo Park, CA
OSTI Identifier:
866475
Patent Number(s):
US 4719436
Assignee:
United States of America as represented by United States (Washington, DC) SLAC
DOE Contract Number:  
AC03-76SF00515
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
stabilized; chromium; oxide; film; air-oxidized; films; deposited; high-power; klystron; ceramic; windows; sleeves; thickness; 20; 150; ang; useful; lowering; secondary; electron; emission; yield; avoiding; multipactoring; window; failure; due; overheating; substrate; chosen; alumina; sapphire; beryllium; films deposited; electron emission; ceramic substrate; oxide film; beryllium oxide; chromium oxide; secondary electron; failure due; chromium film; /333/204/427/

Citation Formats

Garwin, Edward L., and Nyaiesh, Ali R. Stabilized chromium oxide film. United States: N. p., 1988. Web.
Garwin, Edward L., & Nyaiesh, Ali R. Stabilized chromium oxide film. United States.
Garwin, Edward L., and Nyaiesh, Ali R. Fri . "Stabilized chromium oxide film". United States. https://www.osti.gov/servlets/purl/866475.
@article{osti_866475,
title = {Stabilized chromium oxide film},
author = {Garwin, Edward L. and Nyaiesh, Ali R.},
abstractNote = {Stabilized air-oxidized chromium films deposited on high-power klystron ceramic windows and sleeves having a thickness between 20 and 150.ANG. are useful in lowering secondary electron emission yield and in avoiding multipactoring and window failure due to overheating. The ceramic substrate for the film is chosen from alumina, sapphire or beryllium oxide.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1988},
month = {Fri Jan 01 00:00:00 EST 1988}
}

Patent:

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