DAMAGE TO EXTREME-ULTRAVIOLET SC/SI MULTILAYER MIRRORS EXPOSED TO INTENSE 46.9-NM LASER PULSE
No abstract prepared.
- Research Organization:
- Colorado State Univ., Fort Collins, CO (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG03-00ER15084
- OSTI ID:
- 859236
- Journal Information:
- Optics Letters, Vol. 29, Issue 6; ISSN 0146-9592
- Country of Publication:
- United States
- Language:
- English
Similar Records
Molybdenum-strontium multilayer mirrors for the 8-12 nm extreme-ultraviolet wavelength region
MO/B4C/SI MULTILAYER-COATED PHOTODIODE WITH POLARIZATION SENSITIVITY AT AN EXTREME ULTRAVIOLET WAVELENGTH OF 13.5 NM
Resonance Effects in Photoemission from TiO2-capped Mo/Si Multilayer Mirrors for Extreme Ultraviolet Applications
Journal Article
·
Sun Apr 01 00:00:00 EST 2001
· Optics Letters
·
OSTI ID:859236
MO/B4C/SI MULTILAYER-COATED PHOTODIODE WITH POLARIZATION SENSITIVITY AT AN EXTREME ULTRAVIOLET WAVELENGTH OF 13.5 NM
Journal Article
·
Thu Jan 01 00:00:00 EST 2004
· Applied Optics
·
OSTI ID:859236
Resonance Effects in Photoemission from TiO2-capped Mo/Si Multilayer Mirrors for Extreme Ultraviolet Applications
Journal Article
·
Sat Dec 31 00:00:00 EST 2011
· Journal of Applied Physics
·
OSTI ID:859236
+7 more