The relevance of mask-roughness-induced printed line-edge roughness in recent and future EUV lithography tests
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE; Extreme Ultraciolet Limited Liability Company, International Sematech (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 840030
- Report Number(s):
- LBNL-54492; APOPAI; R&D Project: 81EA01; TRN: US200509%%684
- Journal Information:
- Applied Optics, Vol. 43, Issue 20; Other Information: Journal Publication Date: 07/10/2004; PBD: 21 Jan 2004; ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
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