TiN and TiZrV Thin Film as a Remedy Against Electron Cloud

Technical Report · Wed Jan 19 04:00:00 EST 2005

DOI:https://doi.org/10.2172/839756· OSTI ID:839756

Le Pimpec, F ^[1]

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1. SLAC

In many accelerators running positively charged beams, ionization of residual gas and secondary electron emission in the beam pipe will give rise to an electron cloud which can cause beam blow-up or the loss of the circulating beam. One solution to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield (SEY). The SEY of thin films of TiN and sputter-deposited non-evaporable getter were measured for a variety of conditions, including the effect of recontamination in an ultra high vacuum environment. This last process has a different effect on SEY than direct dosing with contaminating gases. In many accelerators running positively charged beams, ionization of residual gas and secondary electron emission in the beam pipe will give rise to an electron cloud which can cause beam blow-up or the loss of the circulating beam. One solution to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield (SEY). The SEY of thin films of TiN and sputter-deposited non-evaporable getter were measured for a variety of conditions, including the effect of recontamination in an ultra high vacuum environment. This last process has a different effect on SEY than direct dosing with contaminating gases.

• Research Organization: Stanford Linear Accelerator Center (SLAC), Menlo Park, CA
• Sponsoring Organization: SC
• DOE Contract Number: AC02-76SF00515
• OSTI ID: 839756
• Report Number(s): SLAC-PUB-10985
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATORS
CLOUDS
ELECTRON EMISSION
ELECTRONS
GASES
GETTERS
IONIZATION
SECONDARY EMISSION
THIN FILMS