Niobium Thin Film Cavity Deposition by ECR Plasma

Conference · Thu Jul 01 00:00:00 EDT 2004

OSTI ID:838713

Valente, A-M; Phillips, H L; Wang, H; Wu, A; Wu, G

Nb/Cu technology for superconducting cavities has proven to be over the years a viable alternative to bulk niobium. Energetic vacuum deposition is a very unique alternative method to grow niobium thin film on copper. Single crystal growth of niobium on sapphire substrate has been achieved as well as good surface morphology of niobium on small copper samples. The design of a cavity deposition system is in development. This paper presents the exploratory studies of the influence of the deposition energy on the Nb thin film properties. Several possible venues to achieve Nb/Cu cavity deposition with this technique are also discussed along with the design of the cavity deposition setup under development.

• Research Organization: Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
• Sponsoring Organization: USDOE Office of Energy Research (ER) (US)
• DOE Contract Number: AC05-84ER40150
• OSTI ID: 838713
• Report Number(s): JLAB-ACC-04-20; DOE/ER/40150-3271; TRN: US0501497
• Resource Relation: Conference: 9th European Particle Accelerator Conference (EPAC 2004), Lucerne (CH), 07/05/2004--07/09/2004; Other Information: PBD: 1 Jul 2004
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATORS
CAVITIES
COPPER
DEPOSITION
DESIGN
MONOCRYSTALS
MORPHOLOGY
NIOBIUM
PLASMA
SAPPHIRE
SUBSTRATES
THIN FILMS