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Character of Defects at an Ion-Irradiated Buried Thin-Film Interface

Journal Article · Wed May 15 00:00:00 EDT 2002 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1470258· OSTI ID:829438

Kalyanaraman, R ^[1]

ORNL

No abstract prepared.

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Research Organization:: ORNL Oak Ridge National Laboratory

Sponsoring Organization:: DOE

DOE Contract Number:: AC05-00OR22725

OSTI ID:: 829438

Report Number(s):: P01-112075

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Vol. 91; ISSN JAPIAU; ISSN 0021-8979

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
DEFECTS
INTERFACES
ION BEAMS
IRRADIATION
THIN FILMS