Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Multilayered YBCO/LaAlO{sub 3}/YBCO films for microwave applications

Book ·
OSTI ID:82842
; ; ;  [1]
  1. National Aeronautics and Space Administration, Cleveland, OH (United States). Lewis Research Center

Multilayered YBa{sub 2}Cu{sub 3}O{sub 7{minus}x} (YBCO)/LaAlO{sub 3}/YBCO films deposited on (100)-oriented LaAlO{sub 3} substrates have been studied for potential use in microwave circuits. The thickness of the LaAlO{sub 3} layer was either 100, 300 or 500 nm thick, and the YBCO films were 350 nm. Metallic normal state resistance was observed in the top YBCO layers, but the transition temperature was higher for films deposited on 100 nm LaAlO{sub 3} layers than for films on 300 nm thick LaAlO{sub 3} layers (88 vs. 83 K). Electrical impedance measurements across the dielectric indicate there was extensive shorting between the YBCO layers, and transmission electron microscopy (TEM) micrographs suggests that the shorting occurred along high-angle grain boundaries in the LaAlO{sub 3} film. The LaAlO{sub 3} films grew with columnar structures; at LaAlO{sub 3} thicknesses greater than approximately 150 nm the columns were no longer parallel, and a chevron-shaped structure emerged.

OSTI ID:
82842
Report Number(s):
CONF-940142--; ISBN 0-8194-1452-2
Country of Publication:
United States
Language:
English

Similar Records

LaAlO sub 3 -YBCO multilayers
Conference · Thu Feb 28 23:00:00 EST 1991 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:5877924

Large-area YBCO films for microwave applications
Conference · Thu Feb 28 23:00:00 EST 1991 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:5720845

Microstructural, transport, and rf properties of multilayer-deposited YBCO films
Conference · Thu Feb 28 23:00:00 EST 1991 · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:5720900