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Title: Final Project Report for Grant DE-FG03-00ER54581 Selective Control of Chemical Reactions With Plasmas

Abstract

OAK-B135 This research work focused on control of the reactive species inside a plasma through measurement and manipulation of the electron energy distribution function (EEDF) and on understanding the surface reaction mechanisms on the substrate exposed to a combination of ion and atom beam sources to simulate a real plasma. A GEC chamber (Gaseous Electronic Conference Reference Cell)8 with a mass spectrometer and a Langmuir probe (LP) system were used for this research. It was found that H2 and N2 additives to an Ar plasma could effectively change the EEDF and the average electron temperature (Te). This finding provides the possibility to selectively control reaction rates in the plasma to control etching selectivity on a surface. This concept was demonstrated in Ar/N2/H2 and Ar/CH4 /H2 systems.

Authors:
Publication Date:
Research Org.:
University of Arizona (US)
Sponsoring Org.:
USDOE Office of Energy Research (ER) (US)
OSTI Identifier:
820945
DOE Contract Number:  
FG03-00ER54581
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 28 Jan 2004
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ADDITIVES; ATOMS; CHEMICAL REACTIONS; ELECTRON TEMPERATURE; ELECTRONS; ENERGY SPECTRA; ETCHING; LANGMUIR PROBE; MASS SPECTROMETERS; PLASMA; REACTION KINETICS; SUBSTRATES; LOW TEMPERATURE PLASMAS; ELECTRON ENERGY DISTRIBUTION FUNCTION; PLASMA CONTROL; AR; H2; N2; CH4; INP; MSQ OK TO RELEASE

Citation Formats

Muscat, Anthony. Final Project Report for Grant DE-FG03-00ER54581 Selective Control of Chemical Reactions With Plasmas. United States: N. p., 2004. Web. doi:10.2172/820945.
Muscat, Anthony. Final Project Report for Grant DE-FG03-00ER54581 Selective Control of Chemical Reactions With Plasmas. United States. doi:10.2172/820945.
Muscat, Anthony. Wed . "Final Project Report for Grant DE-FG03-00ER54581 Selective Control of Chemical Reactions With Plasmas". United States. doi:10.2172/820945. https://www.osti.gov/servlets/purl/820945.
@article{osti_820945,
title = {Final Project Report for Grant DE-FG03-00ER54581 Selective Control of Chemical Reactions With Plasmas},
author = {Muscat, Anthony},
abstractNote = {OAK-B135 This research work focused on control of the reactive species inside a plasma through measurement and manipulation of the electron energy distribution function (EEDF) and on understanding the surface reaction mechanisms on the substrate exposed to a combination of ion and atom beam sources to simulate a real plasma. A GEC chamber (Gaseous Electronic Conference Reference Cell)8 with a mass spectrometer and a Langmuir probe (LP) system were used for this research. It was found that H2 and N2 additives to an Ar plasma could effectively change the EEDF and the average electron temperature (Te). This finding provides the possibility to selectively control reaction rates in the plasma to control etching selectivity on a surface. This concept was demonstrated in Ar/N2/H2 and Ar/CH4 /H2 systems.},
doi = {10.2172/820945},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {1}
}