Photochemical Pattern Transfer and Enhancement of Thin Film Silica Mesophases

Journal Article · Sun Jun 01 00:00:00 EDT 2003 · Nano Letters

DOI:https://doi.org/10.1021/nl0341279· OSTI ID:810181

Dattelbaum, Andrew M.; Amweg, Meri L.; Ecke, Laurel E.; Yee, Chanel K.; Shreve, Andrew P.; Parikh, Atul N.

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 810181
• Report Number(s): LA-UR-02-4977
• Journal Information: Nano Letters, Journal Name: Nano Letters Journal Issue: 6 Vol. 3; ISSN 1530-6984
• Country of Publication: United States
• Language: English

Related Subjects

59 BASIC BIOLOGICAL SCIENCES