A reaction-layer mechanism for the delayed failure of micron-scale polycrystalline silicon structural films subjected to high-cycle fatigue loading
Journal Article
·
· Acta Materialia
OSTI ID:803762
A study has been made of high-cycle fatigue in 2um thick structural films of n+- type, polycrystalline silicon for MEMS applications.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Director, Office of Science (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 803762
- Report Number(s):
- LBNL-49109; ACMAFD; R&D Project: 511906; B& R KC0201030; TRN: US200302%%321
- Journal Information:
- Acta Materialia, Vol. 50, Issue 14; Other Information: Journal Publication Date: Aug. 16, 2002; PBD: 1 Nov 2001; ISSN 1359-6454
- Country of Publication:
- United States
- Language:
- English
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