Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

At-wavelength interferometry of extreme ultraviolet lithographic optics

Book ·
OSTI ID:798362

No abstract prepared.

Research Organization:
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
798362
Report Number(s):
LBNL/ALS--1728
Country of Publication:
United States
Language:
English

Similar Records

Testing extreme ultraviolet optical systems at-wavelength with sub-angstrom accuracy
Book · Tue Jun 01 00:00:00 EDT 1999 · OSTI ID:798360

Point Diffraction Interferometry at EUV Wavelengths
Book · Thu Sep 01 00:00:00 EDT 1994 · OSTI ID:798291

High-accuracy interferometry of extreme ultraviolet lithographic optical systems
Journal Article · Sat Oct 31 23:00:00 EST 1998 · Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures · OSTI ID:800251