Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution

Soufli, Regina; Spiller, Eberhard A; Schmidt, M A; Davidson, J C; Grabner, R F; Gullikson, Eric M; Kaufmann, Benjamin B; Mrowka, Stanley; Baker, S L; Chapman, H N; Hudyma, R M; Taylor, J S; Walton, Chris C; Montcalm, Claude; Folta, J A

Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution

Conference · Wed Jan 31 23:00:00 EST 2001

OSTI ID:798339

Soufli, Regina ^[1]; Spiller, Eberhard A; Schmidt, M A; Davidson, J C; Grabner, R F; Gullikson, Eric M; Kaufmann, Benjamin B; Mrowka, Stanley; Baker, S L; Chapman, H N; Hudyma, R M; Taylor, J S; Walton, Chris C; Montcalm, Claude; Folta, J A

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 798339

Report Number(s):: LBNL/ALS--13670

Country of Publication:: United States

Language:: English

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