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Multilayer coated optics for an alpha-class extreme ultraviolet lithography system

Conference ·
OSTI ID:794627
 [1]; ; ; ; ; ; ;
  1. LBNL Library
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No abstract prepared.

Research Organization:
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
794627
Report Number(s):
LBNL/ALS--1519
Country of Publication:
United States
Language:
English

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Related Subjects

42 ENGINEERING
43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
EXTREME ULTRAVIOLET RADIATION
FABRICATION
INTEGRATED CIRCUITS
OPTICS