Skip to main content

Photodissociation of ethylene sulfide at 193nm: A photofragment translational spectroscopy study with VUV synchrotron radiation and ab initio calculations

Journal Article · Fri Sep 01 00:00:00 EDT 2000 · Journal of the American Chemical Society

OSTI ID:786955

Qi, Fei ^[1]; Sorkhabi, Osman; Suits, Arthur G; Chien, Siu-Hung; Li, Wai-Kee

LBNL Library

No abstract prepared.

Print

Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director, Office of Science (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 786955

Report Number(s):: LBNL--46800; LBNL/ALS--43066

Journal Information:: Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 1 Vol. 123; ISSN JACSAT; ISSN 0002-7863

Country of Publication:: United States

Language:: English

Similar Records

193 nm photodissociation of propylene sulfide: A photofragment translational spectroscopy study with VUV synchrotron radiation

Journal Article · Tue May 01 00:00:00 EDT 2001 · Journal of Physical Chemistry A · OSTI ID:821318

Photodissociation of Oxalyl Chloride at 193nm Probed Via Synchrotron Radiation

Journal Article · Fri Jan 31 23:00:00 EST 1997 · Journal of Physical Chemistry A · OSTI ID:800638

UV Photodissociation Dynamics of allyl radical by photofragment translational spectroscopy

Journal Article · Fri Feb 06 23:00:00 EST 1998 · Journal of Chemical Physics · OSTI ID:8615

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
43 PARTICLE ACCELERATORS
ETHYLENE
SPECTROSCOPY
SULFIDES
SYNCHROTRON RADIATION