Fabrication of Photonic band gap Materials
Patent Application
·
OSTI ID:784376
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microsphere, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microsphere there from. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microsphere may be polystyrenemicrosphere.
- Research Organization:
- Ames Lab., Ames, IA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-7405-ENG-82
- Assignee:
- DOEGC; EDB-01:075486
- Patent Number(s):
- PATENTS-US-A9477191; US patents application 9-477,191
- Application Number:
- 9-477,191; TRN: AH200129%%217
- OSTI ID:
- 784376
- Resource Relation:
- Patent File Date: 2000 Jan 05; Other Information: PBD: 5 Jan 2000
- Country of Publication:
- United States
- Language:
- English
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