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Title: Thiogallate Blue Phosphors for Thin Film Electroluminescent Flat Panel Displays

Technical Report ·
DOI:https://doi.org/10.2172/770502· OSTI ID:770502
 [1];  [2]
  1. Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
  2. Planar Systems, Inc., Beaverton, OR (United States)

This project helped to develop a metal-organic chemical vapor deposition (MOCVD) method that could improve the efficiency of the blue phosphor for full color thin-film electroluminescent (TFEL) flat panel displays. High quality SrS and SrS:Ce thin films were deposited from Sr(thd)2, Ce(thd)4 and H2S via a low pressure MOCVD process. Film characteristics were found to be insensitive to the presence of the cerium dopant in the concn. range investigated. Depositions were carried out for a wide temp. range (250-550°C). Deposition rates were found to be relatively insensitive for the temp. range investigated. The films produced were found to be highly cryst. at all temps. investigated. Deposited material showed texturing as a function of substrate material and temp. FWHM of the a 111 ii reflections were found to have a 2Q values of 0.15-0.18 deg. for all temps. RBS and AES shows stoichiometric 1 : 1 SrS with less than 2% carbon and oxygen contaminates. ERO indicates the films to have 1- 2.5% hydrogen. Films doped with 0.019-0.043 atom % Ce showed weak blue-green to green PL with increasing dopant concn. Doped films yielded up to 3.2 cd/m2 EL emission with CIE coordinates of x = 0.22 and y = 0.32 and turn-on voltages of 150-250 V.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
770502
Report Number(s):
LA-CRADA-97-22; LA-CRADA-97-0022; CRADA No. LA95C10192
Country of Publication:
United States
Language:
English