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The Dynamic Competition Between Stress Generation and Relaxation Mechanisms During Coalescence of Volmer-Weber Thin Films

Journal Article · Mon Oct 09 00:00:00 EDT 2000 · Journal of Applied Physics

OSTI ID:765027

Floro, J A ^[1]; Hearne, S J; Hunter, J A; Kotula, P G; Chason, E; Seel, S C; Thompson, C V

Sandia National Laboratories

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Research Organization:: Sandia National Laboratories, Albuquerque, NM (US); Sandia National Laboratories, Livermore, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC04-94AL85000

OSTI ID:: 765027

Report Number(s):: SAND2000-2484J

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
COALESCENCE
RELAXATION
RESIDUAL STRESSES
THIN FILMS