A continuous sampling air-ICP for metals emission monitoring
An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF)--echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.
- Research Organization:
- Ames Lab., IA (US) (US)
- Sponsoring Organization:
- US Department of Energy (US) (US)
- DOE Contract Number:
- W-7405-ENG-82
- OSTI ID:
- 754791
- Report Number(s):
- IS-M-890
- Country of Publication:
- United States
- Language:
- English
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