Pulsed-Laser Deposition of Electronic Oxides: Superconductor and Semiconductor Applications

Conference · Mon Jan 24 04:00:00 EST 2000

OSTI ID:751428

Norton, D P ^[1]; Park, C; Lee, Y E; Budai, J D; Chisholm, M F; Verebelyi, D T; Christen, D K; Kroeger, D M

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1. ORNL

Over the past decade, pulsed-laser deposition (PLD) has proven to be one of the most versatile and effective methods for obtaining high-quality electronic oxide thin-film materials. Much of this success can be attributed to its initial use in depositing high temperature superconducting materials. However, pulsed-laser deposition is now a leading research tool in the development of various electronic oxide thin-film technologies, In this paper, recent progress in the deposition of oxide materials on dissimilar materials for both superconductor and semiconductor applications is discussed. Recent developments in the synthesis of superconducting wires via epitaxial growth of superconducting oxides on biaxially textured metal tapes is described. In addition, efforts to integrate high-k dielectric oxides on semiconductor surfaces using pulsed-laser deposition are highlighted.

• Research Organization: Oak Ridge National Lab., TN (US)
• Sponsoring Organization: USDOE Office of Science (US)
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 751428
• Report Number(s): ORNL/CP-105775
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING
DIELECTRIC
DIELECTRIC MATERIALS
DISSIMILAR EPITAXY
ELECTRONIC OXIDES
EPITAXIAL GROWTH
FABRICATION
LASERS
MANUFACTURING
MICROELECTRONICS
OXIDES
PHYSICAL VAPOR DEPOSITION
PULSED-LASER DEPOSITION
SEMICONDUCTOR MATERIALS
SUPERCONDUCTING WIRES
SUPERCONDUCTOR
SUPERCONDUCTORS