Trace water determination in gases by infrared spectroscopy

Technical Report · Mon May 01 00:00:00 EDT 1995

DOI:https://doi.org/10.2172/74625· OSTI ID:74625

Stallard, B R ^[1]; Espinoza, L H; Niemczyk, T M ^[2]

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1. Sandia National Labs., Albuquerque, NM (United States). Contamination Free Manufacturing Research Center
2. Univ. of New Mexico, Albuquerque, NM (United States). Dept. of Chemistry

Water determination in semiconductor process gases is desirable in order to extend the life of gas delivery systems and improve wafer yields. The authors review their work in applying Fourier transform infrared spectroscopy to this problem, where a 10 ppb detection limit has been demonstrated for water in N{sub 2}, HCl, and HBr. The potential for optical determination of other contaminants in these gases is discussed. Also, alternative optical spectroscopic approaches are briefly described. Finally, they discuss methods for dealing with interference arising from water in the instrument beam path, yet outside the sample cell.

• Research Organization: Sandia National Labs., Albuquerque, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 74625
• Report Number(s): SAND--95-0835C; CONF-9504117--1; ON: DE95011054; CRN: C/SNL--SC9301082
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
42 ENGINEERING
ABSORPTION SPECTROSCOPY
CALIBRATION
EXPERIMENTAL DATA
FABRICATION
FOURIER TRANSFORMATION
HYDROBROMIC ACID
HYDROCHLORIC ACID
INFRARED RADIATION
INFRARED SPECTRA
NITROGEN
ON-LINE MEASUREMENT SYSTEMS
QUANTITATIVE CHEMICAL ANALYSIS
SEMICONDUCTOR DEVICES
TRACE AMOUNTS
WATER