100 kV field emission electron optics for nanolithography
Journal Article
·
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
- Etec Systems, Inc., Hayward, CA (United States)
A 100 kV optics with field emission source is designed for an electron-beam nanolithography system. A new electrostatic gun lens permits high-voltage operation with low aberrations. A demagnifying double-lens column with fixed magnification and variable aperture is used. The optics are weighted towards 100 kV operation, but the beam voltage can be varied from 25 to 100 kV with resolution maintained below 20 nm. The gun uses a Zr/O/W[l angle]100[r angle] cathode operated near the extended-Schottky emission regime to achieve 1%/h current stability at a fixed extraction voltage. With the source emitting a 0.5 mA/sr angular intensity, 1.5 nA can be focused to 6 and 10 nm with beam voltages of 100 and 50 kV, respectively. A target current density of 2000 A/cm [sup 2] with an effective brightness of 1[times]10[sup 8] A/cm [sup 2] sr enables 2 MHz pixel rate exposures of PMMA at 100 kV with a vector-scan deflection system. 6 refs., 14 figs.
- OSTI ID:
- 7369147
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 10:6; ISSN 0734-211X; ISSN JVTBD9
- Country of Publication:
- United States
- Language:
- English
Similar Records
100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning
Experimental gun brightness measurements on a 300 kV CFEG
Optical column design with liquid metal ion sources
Conference
·
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
·
OSTI ID:6133812
Experimental gun brightness measurements on a 300 kV CFEG
Conference
·
Wed Dec 31 23:00:00 EST 1997
·
OSTI ID:638236
Optical column design with liquid metal ion sources
Journal Article
·
Sat Oct 31 23:00:00 EST 1981
· J. Vac. Sci. Technol.; (United States)
·
OSTI ID:5971747
Related Subjects
42 ENGINEERING
420200 -- Engineering-- Facilities
Equipment
& Techniques
440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
BRIGHTNESS
CURRENT DENSITY
DESIGN
ELECTRON BEAM MACHINING
ELECTRON GUNS
EMISSION
ESTERS
EVALUATION
FIELD EMISSION
MACHINING
OPTICAL PROPERTIES
OPTICAL SYSTEMS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PHYSICAL PROPERTIES
PMMA
POLYACRYLATES
POLYMERS
POLYVINYLS
RESOLUTION
SPECIFICATIONS
SURFACE FINISHING
SURFACES
420200 -- Engineering-- Facilities
Equipment
& Techniques
440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
BRIGHTNESS
CURRENT DENSITY
DESIGN
ELECTRON BEAM MACHINING
ELECTRON GUNS
EMISSION
ESTERS
EVALUATION
FIELD EMISSION
MACHINING
OPTICAL PROPERTIES
OPTICAL SYSTEMS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PHYSICAL PROPERTIES
PMMA
POLYACRYLATES
POLYMERS
POLYVINYLS
RESOLUTION
SPECIFICATIONS
SURFACE FINISHING
SURFACES