A model for uv preionization in electric-discharge-pumped XeF and KrF lasers

Journal Article · Sat Jan 15 04:00:00 EST 1977 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.89304· OSTI ID:7345188

Hsia, J

A mechanism is proposed to explain the improvement in discharge uniformity observed in pure electric-discharge-pumped rare-gas halide lasers when a uv preionizer is used to precondition the laser medium. In the model the F/sup -/ ions formed by dissociative attachment following uv photoionization act as a reservoir from which electrons are easily released when the main discharge field is applied. The model shows that a time delay is required between the application of the uv and the main discharge, and also that the effect of the preionizer can last some tens of microseconds despite the large electron attachment rates in the laser mixture. (AIP)

• Research Organization: Avco Everett Research Laboratory, Inc., Everett, Massachusetts 02149
• OSTI ID: 7345188
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 30:2; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
EFFICIENCY
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
IONIZATION
KINETICS
KRYPTON COMPOUNDS
KRYPTON FLUORIDES
LASERS
PHOTOIONIZATION
RADIATIONS
RARE GAS COMPOUNDS
REACTION KINETICS
ULTRAVIOLET RADIATION
XENON COMPOUNDS
XENON FLUORIDES