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Title: Adsorption and reactions of tetraethoxysilane (TEOS) on clean and water-dosed titanium dioxide (110)

Journal Article · · Journal of the American Chemical Society; (United States)
DOI:https://doi.org/10.1021/ja00078a055· OSTI ID:7302123

The adsorption and reactions of tetraethoxysilane (TEOS) vapor on clean and water-predosed rutile TiO[sub 2]-(110) have been studied using temperature-programmed desorption (TPD), low-energy electron diffraction (LEED), and X-ray photoelectron spectroscopy (XPS). The molecule sticks with a probability near unity at temperatures of 130-300 K, and at low coverage, TEOS dissociates upon heating. At higher coverages, some desorbs. On the water-and hydroxyl-free surface, the dissociation reaction occurs rapidly between 200 and 350 K, with the initial products being Si(OEt)[sub 15s] plus 2EtO[sub 3] (ET = C[sub 2]H[sub 5]). This is a new mechanism for silane coupling to oxide surfaces which requires neither hydroxyl groups nor surface defects. The EtO ligands, whether attached to Ti or Si atoms, decompose at approximately 650 K via [beta]-hydrogen elimination to yield ethylene gas and surface-bound hydrogen, which rapidly attaches to another EtO ligand, yielding ethanol gas. By 700 K, the net products evolved are equal amounts of ethylene and ethanol gas (two molecules of each per dissociated TEOS molecule), while SiO[sub 2] remains on the surface. 41 refs., 7 figs.

OSTI ID:
7302123
Journal Information:
Journal of the American Chemical Society; (United States), Vol. 115:25; ISSN 0002-7863
Country of Publication:
United States
Language:
English