Adsorption and reactions of tetraethoxysilane (TEOS) on clean and water-dosed titanium dioxide (110)
- Univ. of Washington, Seattle, WA (United States)
The adsorption and reactions of tetraethoxysilane (TEOS) vapor on clean and water-predosed rutile TiO[sub 2]-(110) have been studied using temperature-programmed desorption (TPD), low-energy electron diffraction (LEED), and X-ray photoelectron spectroscopy (XPS). The molecule sticks with a probability near unity at temperatures of 130-300 K, and at low coverage, TEOS dissociates upon heating. At higher coverages, some desorbs. On the water-and hydroxyl-free surface, the dissociation reaction occurs rapidly between 200 and 350 K, with the initial products being Si(OEt)[sub 15s] plus 2EtO[sub 3] (ET = C[sub 2]H[sub 5]). This is a new mechanism for silane coupling to oxide surfaces which requires neither hydroxyl groups nor surface defects. The EtO ligands, whether attached to Ti or Si atoms, decompose at approximately 650 K via [beta]-hydrogen elimination to yield ethylene gas and surface-bound hydrogen, which rapidly attaches to another EtO ligand, yielding ethanol gas. By 700 K, the net products evolved are equal amounts of ethylene and ethanol gas (two molecules of each per dissociated TEOS molecule), while SiO[sub 2] remains on the surface. 41 refs., 7 figs.
- OSTI ID:
- 7302123
- Journal Information:
- Journal of the American Chemical Society; (United States), Vol. 115:25; ISSN 0002-7863
- Country of Publication:
- United States
- Language:
- English
Similar Records
Reactions of tetraethoxysilane vapor on polycrystalline titanium dioxide
Surface modeling of thin film growth: A study of silicon oxide deposition from tetraethoxysilane and silicon deposition from disilane on the Si(100) surface
Related Subjects
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
SILOXANES
ADSORPTION
DESORPTION
DISSOCIATION
HEAVY WATER
REACTION INTERMEDIATES
RUTILE
SILANES
TITANIUM OXIDES
VAPORS
X-RAY SPECTROSCOPY
CHALCOGENIDES
FLUIDS
GASES
HYDRIDES
HYDROGEN COMPOUNDS
MATERIALS
MINERALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
RADIOACTIVE MATERIALS
RADIOACTIVE MINERALS
SILICON COMPOUNDS
SORPTION
SPECTROSCOPY
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
WATER
400201* - Chemical & Physicochemical Properties
400102 - Chemical & Spectral Procedures