Plasma-injection-stabilized discharges in CO and He at low temperatures

Journal Article · Tue Nov 01 04:00:00 EST 1977 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.323500· OSTI ID:7282742

Cohn, D B; Lim, D G

Pulsed and cw discharges in low-temperature flowing mixtures of CO and He, typical of those required for efficient laser action at 5 ..mu..m, are stabilized by convective flow injection of a weakly ionized plasma maintained by an auxiliary discharge adjacent to the main discharge volume. Pulsed input energy densities range from 0.5 kJ/l atm at 300 K to 0.2 kJ/l atm at 80 K for pressures on the order of 50 Torr and discharge pulse lengths of approximately 1 ..mu..s. Continuous discharge operation has been demonstrated with specific input powers of 300 W/(g/s) at pressures and temperatures of 40 Torr and 110 K.

• Research Organization: Northrop Corporation, Northrop Research and Technology Center, 3401 West Broadway, Hawthorne, California 90250
• OSTI ID: 7282742
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 48:11; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
BEAM INJECTION
CARBON COMPOUNDS
CARBON MONOXIDE
CARBON MONOXIDE LASERS
CARBON OXIDES
CHALCOGENIDES
CRYOGENIC FLUIDS
EFFICIENCY
ELECTRIC DISCHARGES
ELEMENTS
FLUID FLOW
FLUIDS
GAS FLOW
GAS LASERS
HELIUM
IONIZATION
LASERS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PLASMA BEAM INJECTION
RARE GASES
STABILIZATION