Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens

Journal Article · Fri Jul 01 00:00:00 EDT 1994 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.579197· OSTI ID:7276439

Baer, D R; Engelhard, M H; Schulte, D W; Guenther, D E; Wang, L; Rieke, P C ^[1]

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1. Pacific Northwest Laboratory, Richland, Washington 99352 (United States)

This paper examines the damage created by an electron beam on layered specimens consisting of a (CH[sub 2])[sub 17] self-assembled monolayer (SAM) deposited on an oxidized Si wafer. Beam effects on both the SAM and substrate were observed. X-ray photoelectron spectroscopy (XPS) measurements indicate that less than 20% of the carbon from the film is lost during the beam damage, ion analysis shows hydrogen emission from the films, and residual gas analysis suggest loss of some CH[sub [ital x]] ([ital x]=2--4) molecules. Consistent with the conversion of some (CH)[sub [ital n]] chains to graphite,'' the C 1[ital s] photopeak is broadened by the electron beam. In addition to the effects on the SAM layer, there are shifts for the O 1[ital s] and oxidized-Si[sub 2[ital p]] binding energies due to the electron beam exposure. Studies on SiO[sub 2] films formed in a wide variety of ways, without the SAM, show similar effects. These shifts are attributed to changes in potential at the Si--SiO[sub 2] interface.

• DOE Contract Number: AC06-76RL01830
• OSTI ID: 7276439
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Vol. 12:4; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ORGANIC CHLORINE COMPOUNDS
PHYSICAL RADIATION EFFECTS
SILICON
INTERFACES
SILICON OXIDES
BINDING ENERGY
ELECTRON BEAMS
ELECTRONIC STRUCTURE
KEV RANGE 01-10
PHOTOELECTRON SPECTROSCOPY
BEAMS
CHALCOGENIDES
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY
ENERGY RANGE
KEV RANGE
LEPTON BEAMS
ORGANIC COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PARTICLE BEAMS
RADIATION EFFECTS
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY
360605* - Materials- Radiation Effects