X-ray photoelectron spectroscopy analysis of aluminum and copper cleaning procedures for the Advanced Photon Source

Journal Article · Fri Jul 01 04:00:00 EDT 1994 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.579001· OSTI ID:7275062

Rosenberg, R A; McDowell, M W; Noonan, J R ^[1]

---

1. Advanced Photon Source, Argonne National Lab, Argonne, Illinois 60439 (United States)

The Advanced Photon Source (APS), presently under construction, will produce x rays of unprecedented brightness. The storage ring where the x rays will be produced will be constructed from an extruded 6063 aluminum alloy, while transition pieces (flanges, etc.) will be made from a 2219 aluminum alloy. In addition, cooled photon absorbers will be placed in strategic locations throughout the ring to intercept the majority of the unused high power-density radiation. These will be made of either CDA-101 (OFHC) copper or glidcop (a dispersion strengthened copper alloy). Before any of these components can be assembled they must be cleaned to remove surface contaminants so that the ultrahigh vacuum ([lt]0.1 nTorr) necessary for successful operation can be achieved. Many recipes for cleaning aluminum and copper exist; however, most of them involve the use of chemicals that present safety and/or environmental concerns. We have undertaken an x-ray photoelectron spectroscopy study of the effects of a variety of commercially available cleaners on the surface cleanliness of aluminum and copper. Several important results have been identified in this study. A simple alkaline detergent in an ultrasonic bath cleans aluminum alloys as effectively as the more aggressive cleaning solutions. The detergent can be used at 65 [degree]C to clean the 6063 alloy and at 50 [degree]C to clean the 2219 alloy. A citric acid based cleaner was found to be effective at cleaning copper, although the surface oxidizes rapidly. To date, we have been unable to find a universal cleaning procedure, i.e., one that is optimal for cleaning both Al and Cu.

• OSTI ID: 7275062
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:4; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
43 PARTICLE ACCELERATORS
430400* -- Particle Accelerators-- Storage Rings
ADDITIVES
ADVANCED PHOTON SOURCE
ALLOYS
ALUMINIUM ALLOYS
CLEANING
COPPER
COPPER ALLOYS
DETERGENTS
ELECTRON SPECTROSCOPY
ELEMENTS
EMULSIFIERS
MATERIALS
METALS
PHOTOELECTRON SPECTROSCOPY
RADIATION SOURCES
SOUND WAVES
SPECTROSCOPY
SURFACE CLEANING
SURFACE FINISHING
SURFACTANTS
SYNCHROTRON RADIATION SOURCES
TRANSITION ELEMENTS
ULTRASONIC WAVES
VACUUM SYSTEMS
WETTING AGENTS