Secondary air supply means of exhaust gas cleaning devices

Patent · Tue Jun 15 04:00:00 EDT 1976

OSTI ID:7263992

Yamada, M; Kitamura, Y

In an exhaust gas cleaning device having a reaction chamber, a secondary air supply consists of a portion of the exhaust pipe upstream of the reaction chamber which is constructed into a double wall structure having an inner wall defining an exhaust gas passage and an outer wall defining an outer chamber for the passage of secondary air. A valve opens and closes a secondary air supply hole formed in the inner wall and an air releasing hole formed in the outer wall for releasing the secondary air into the atmosphere. A temperature detector is disposed within the reaction chamber and controls the valve. When the internal temperature of the reaction chamber is lower than a predetermined level, the secondary air heated during passage through the outer chamber is supplied into the exhaust gas passage from the secondary air supply hole, while when the internal temperature of the reaction chamber becomes higher than the predetermined level, the secondary air cools the exhaust gases through the inner wall and is released into the atmosphere through the air releasing hole.

• Assignee: Nippondenso Co., Ltd.
• Patent Number(s): US 3963444
• OSTI ID: 7263992
• Country of Publication: United States
• Language: English

Related Subjects

33 ADVANCED PROPULSION SYSTEMS
330700* -- Advanced Propulsion Systems-- Emission Control
AFTERBURNERS
AIR
CATALYTIC CONVERTERS
CONTROL EQUIPMENT
CONTROL SYSTEMS
DUCTS
ENGINES
EQUIPMENT
EXHAUST GASES
FLOW REGULATORS
FLUIDS
GASEOUS WASTES
GASES
INTERNAL COMBUSTION ENGINES
MIXING
POLLUTION CONTROL EQUIPMENT
TEMPERATURE DEPENDENCE
VALVES
WASTES