Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Ionizing radiation effects in n-channel (Hg,Cd)Te misfets with anodic sulfide passivation

Conference · · IEEE Trans. Nucl. Sci.; (United States)
OSTI ID:7256794
The effect of ionizing radiation, up to a dose of 1.6x10/sup 5/ rad(ZnS), on n-channel (Hg,Cd)Te MISFETs, fabricated using anodic sulfideZnS insulators, has been investigated. Devices were irradiated under DC bias at 78K. Radiation induced threshold voltage shifts, degraded transconductance, and decreased subthreshold current-gate voltage slopes were observed. For all but the most negative biases during irradiation, threshold voltage shifts (a maximum of -6.0 V at 1.6x10/sup 5/ rad(ZnS)) are associated with net hole trapping, with evidence for trapping near the interface for zero applied field during irradiation. Evidence of electron trapping was observed for large negative biases during irradiation. The radiation induced degradation in transconductance is attributed to surface mobility reduction (30% after 1.6x10/sup 5/ rad(ZnS)) associated with scattering from interface charge. The decreased subthreshold slope (82 mVdecade at 50K after 1.0x10/sup 5/ rad(ZnS)) is attributed to modification of the pre-irradiation gate voltage-surface potential relationship by radiation induced interface traps.
Research Organization:
Naval Research Lab., Washington, DC (US)
OSTI ID:
7256794
Report Number(s):
CONF-8707112-
Conference Information:
Journal Name: IEEE Trans. Nucl. Sci.; (United States) Journal Volume: NS-34:6
Country of Publication:
United States
Language:
English