Oxidation resistance of TiAl intermetallics improved by vacuum aluminizing

Book · Sat Jul 01 04:00:00 EDT 1995

OSTI ID:72534

Hsu, I C; Wu, S K; Lin, R Y ^[1]

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1. National Taiwan Univ., Taipei (Taiwan, Province of China). Inst. of Materials Science and Engineering

TiAl binary intermetallics were aluminized in a vacuum system in order to improve their oxidation resistance. From the observations of optical microscopy and EPMA line scan, several different reaction layers were observed to be formed on respective substrates: pure Ti, Ti-32at.%Al, Ti-50at.%Al. From the results of the X-ray diffraction, the primary reaction layers were identified as TiAl{sub 3} structure in these three substrates . This reacted layer grows with preferred orientation having {rvec c} axis of TiAl{sub 3} perpendicular to the substrate surface from XRD experiments. High temperature oxidation tests revealed that vacuum aluminized layer was responsible for remarkable improvement on the oxidation resistance.

• OSTI ID: 72534
• Report Number(s): CONF-941144--; ISBN 1-55899-265-0
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
ALUMINIUM OXIDES
CORROSION RESISTANCE
EXPERIMENTAL DATA
HEAT RESISTING ALLOYS
INTERMETALLIC COMPOUNDS
MICROSTRUCTURE
OXIDATION
PROTECTIVE COATINGS
TITANIUM ALLOYS