Analytical diffusion model computer program. Interim report
Technical Report
·
OSTI ID:7251496
The Analytical Diffusion Model (ADM) program has been written to predict the performance of continuous wave (cw) HF or DF chemical lasers. ADM performs laminar and turbulent calculations for slit or axisymmetric nozzles. It is based upon a temperature-dependent analytical solution for the premixed case coupled with a flame sheet mixing scheme, and can be run under either constant pressure or constant density conditions. The ADM program is ideal for parametric studies because of its minimal computer run time and is able to reproduce the results of the numerical cw chemical laser programs consistently to within a few percent.
- OSTI ID:
- 7251496
- Report Number(s):
- AD-A-019692
- Country of Publication:
- United States
- Language:
- English
Similar Records
Comparative performance of chemical lasers with axisymmetric and two-dimensional nozzles. Interim report
A temperature-dependent analytical diffusion model for continuous-wave (f + h2) chemical lasers
Pressure recovery in a constant-area diffuser for chemical lasers with nozzle base relief. Interim report. [HF]
Technical Report
·
Fri Aug 27 00:00:00 EDT 1976
·
OSTI ID:7328305
A temperature-dependent analytical diffusion model for continuous-wave (f + h2) chemical lasers
Technical Report
·
Fri Jul 23 00:00:00 EDT 1976
·
OSTI ID:7305292
Pressure recovery in a constant-area diffuser for chemical lasers with nozzle base relief. Interim report. [HF]
Technical Report
·
Mon Jun 30 00:00:00 EDT 1975
·
OSTI ID:7185167