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Electron density measurements of electron beam pumped XeCl laser mixtures

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.97282· OSTI ID:7250357
Time-dependent electron density measurements of electron beam pumped XeCl laser mixtures (nonlasing) are performed using a CO/sub 2/ (10.6 ..mu..m) quadrature interferometer. The electron beam pulse length is approx. =500 ns (full width at half-maximum) and delivers approx. >10 A/cm/sup 2/ at the foil. Electron densities are measured as a function of the halogen (HCl) and xenon concentration. For a 99.3% Ne/1.5% Xe/0.16% HCl mixture at 3000 Torr, the electron density peaks near the beginning of the pulse at approx. =7 x 10/sup 14/ cm/sup -3/, decreases to 3 x 10/sup 14/ cm/sup -3/, then gradually increases to approx. =6 x 10/sup 14/ cm/sup -3/ at the end of the pulse. As the initial halogen concentration is reduced, the electron density increases, rising dramatically near the end of the pulse. This increase in the electron density later in the pulse is accompanied by a decrease of the XeCl* sidelight fluorescence.
Research Organization:
Spectra Technology, Incorporated, 2755 Northup Way, Bellevue, Washington 98004
OSTI ID:
7250357
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 49:23; ISSN APPLA
Country of Publication:
United States
Language:
English

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