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Thermally induced rearrangement of. cap alpha. -zirconocenyl thioethers: carbon-carbon bond formation via a transition-metal hydroxymethyl or metalloxirane analog

Journal Article · · Organometallics; (United States)
DOI:https://doi.org/10.1021/om00091a002· OSTI ID:7247288
The thermal rearrangement of ..cap alpha..-zirconocenyl thioethers (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/Zr(Ar)(CH(SC/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)) (Ar = C/sub 6/H/sub 5/, rho-C/sub 6/H/sub 4/CH/sub 3/, rho-C/sub 6/H/sub 4/OCH/sub 3/, rho-C/sub 6/H/sub 4/Cl) and (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/ZrC/sub 6/H/sub 5/(CH(SCH/sub 33/)(Si(CH/sub 3/)/sub 3/)) in toluene solution follows clean first-order kinetics to produce (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/Zr(SC/sub 6/H/sub 5/)(CH(Ar)(Si(CH/sub 3/)/sub 3/)) and (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/Zr(SCH/sub 3/)(CH(C/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)). Labeling studies using (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/Zr(rho-C/sub 6/H/sub 4/CH/sub 3/)(CH(SC/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)) and (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/ZrC/sub 6/H/sub 5/(CD(SC/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)) show this rearrangement to be intramolecular. Activation parameters for the rearrangement of (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/ZrC/sub 6/H/sub 5/(CH(SC/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)) were found to be ..delta..H++ = 20.30 (43) kcal,mol and ..delta..S++ = -19.0 (2) eu. It is proposed that this rearrangement proceeds by intramolecular nucleophilic attack (migration) of the aryl group to the methylene carbon with commensurate breaking of the C-S bond. A Hammett plot of log (k/sub obsd/) for the rearrangement of (eta/sup 5/-C/sub 5/H/sub 5/)/sub 2/Zr(Ar)(CH(SC/sub 6/H/sub 5/)(Si(CH/sub 3/)/sub 3/)) versus sigma/sub rho/ produces a straight line (rho = 2.22 (9), supporting this mechanism.
Research Organization:
West Virginia Univ., Morgantown (USA)
OSTI ID:
7247288
Journal Information:
Organometallics; (United States), Journal Name: Organometallics; (United States) Vol. 7:1; ISSN ORGND
Country of Publication:
United States
Language:
English