Large-volume UV preionized TEA CO/sub 2/ laser containing Ar
Journal Article
·
· Chin. Phys. Lasers; (United States)
OSTI ID:7245822
In a large-volume UV preionized TEA CO/sub 2/ laser, partial replacement of He with industrial-grade Ar is possible. The effects of Ar contents on the discharge stability and the output pulse energy are studied. When CO/sub 2/--N/sub 2/--He--Ar is doped with tripropylamine, the discharge stability is improved.
- Research Organization:
- Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai
- OSTI ID:
- 7245822
- Journal Information:
- Chin. Phys. Lasers; (United States), Journal Name: Chin. Phys. Lasers; (United States) Vol. 14:11; ISSN CPLAE
- Country of Publication:
- United States
- Language:
- English
Similar Records
Discharge energy loading characteristics of a UV-preionized TEA CO/sub 2/ laser
Parametric studies of uv preionization in TEA CO/sub 2/ laser
Multiple preionization discharge TEA CO/sub 2/ laser
Journal Article
·
Sun Jan 31 23:00:00 EST 1982
· Rev. Sci. Instrum.; (United States)
·
OSTI ID:5813612
Parametric studies of uv preionization in TEA CO/sub 2/ laser
Journal Article
·
Thu Jan 31 23:00:00 EST 1980
· J. Appl. Phys.; (United States)
·
OSTI ID:5507303
Multiple preionization discharge TEA CO/sub 2/ laser
Journal Article
·
Sat May 01 00:00:00 EDT 1976
· Rev. Sci. Instrum.; (United States)
·
OSTI ID:7197064